DocumentCode
434093
Title
Research of plasma CF/sub 2/CL/sub 2//O/sub 2/ through the sensor of emission spectral type
Author
Bohomolov, B.K.
fYear
2004
fDate
21-24 Sept. 2004
Firstpage
216
Lastpage
216
Abstract
The research of plasma chemical etching of silicon on the equipment "Plasma-600" is carried out. The dependencies of the current of the emission-spectral type sensor against flow of oxygen are measured. The influence -on these dependencies of absorption of light, of coating the quartz reactor walls by fluorplast, of presence of silicon in. the reactor is considered. Some new effects were revealed.
Keywords
Absorption; Chemical sensors; Current measurement; Etching; Fluid flow measurement; Inductors; Plasma applications; Plasma chemistry; Plasma measurements; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Instrument Engineering Proceedings, 2004. APEIE 2004. 2004 7th International Conference on Actual Problems of
Conference_Location
Novosibirsk, Russia
Print_ISBN
0-7803-8476-8
Type
conf
Filename
1427232
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