• DocumentCode
    43475
  • Title

    Evaluating Material Performance Between High-Current Contacts

  • Author

    Hester, Lynda ; Compton, Logan ; Young, Marcus ; Shores, Daniel ; Wise, Daniel ; Iglesias, Angel Moises ; Mejeur, Joel

  • Author_Institution
    Naval Surface Warfare Center, Dahlgren, VA, USA
  • Volume
    43
  • Issue
    5
  • fYear
    2015
  • fDate
    May-15
  • Firstpage
    1572
  • Lastpage
    1579
  • Abstract
    A high-current test fixture (HiCTF) was developed to examine material response to repulsive forces generated between electrically conducting material pairs during short pulses of high current, similar to conditions experienced in Electromagnetic Launch applications. Based upon Holm´s contact theory with additional preload and pressure distribution parameters, this test fixture was designed to use a loading press to apply preload to the test specimens while conducting current through the specimen contact interface. The fixture uses an aligned mechanical loading device to provide a preload across the contact interface of the specimen. The HiCTF will allow for investigation of contact response sensitivity as a function of its degradation, impact of geometry variation, surface conditions, material pairing, preload, and contact integrity. Statistically based experimental designs have been constructed and analysis methodologies developed that incorporate likelihood ratio analysis and the Neyer method. The Neyer D-optimal design method, used in sensitivity testing of explosives, shows promise as an appropriate test method for HiCTF results and will be used to provide sufficient information for comparisons and developmental thresholds. Results from HiCTF testing provide insight into the electrical contact phenomenon and high-current material response. This paper provides an overview of the HiCTF, its motivation, analysis methodology, results, observations, and lessons learned.
  • Keywords
    conducting materials; electromagnetic launchers; HiCTF; Holm contact theory; Neyer D-optimal design method; contact integrity; contact response sensitivity; electrical contact phenomenon; electrically conducting material; geometry variation; high-current contacts; high-current test fixture; material pairing; material performance; pressure distribution parameters; repulsive forces; sensitivity testing; Aluminum; Contacts; Force; Sensitivity; Standards; Stress; Testing; Contact response sensitivity; high-current test fixture (HiCTF); high-current test fixture (HiCTF).;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2015.2414893
  • Filename
    7094304