Title :
Analysis of optimized micro-rotating-structure for MEMS
Author :
Liu, Zutao ; Huang, Qing-An ; Li, Weihua
Author_Institution :
Key Lab. of MEMS, Southeast Univ., Nanjing, China
Abstract :
The paper presents an optimized micro-rotating structure for local measurement of residual strain in a thin film. The structure is composed of two actuating beams and an indicating beam. An analytical model is derived to relate the measured displacement to the residual strain of the thin film. Finite-element modeling is also used to confirm the model.
Keywords :
finite element analysis; internal stresses; micromachining; microsensors; strain measurement; strain sensors; thin films; MEMS optimized micro-rotating-structure; actuating beams; finite-element modeling; indicating beam; micromachining; residual strain measurement; stress; thin film strain; Capacitive sensors; Compressive stress; Displacement measurement; Micromachining; Micromechanical devices; Residual stresses; Strain measurement; Stress measurement; Tensile stress; Transistors;
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
DOI :
10.1109/ICSICT.2004.1435171
