Title :
A study on etching profiles of sacrificial layers
Author :
Chang-Ju, Wu ; Jin Zhoug-he ; Hui-Lian, Ma ; Yue-Lin, Wang
Author_Institution :
Dept. of Inf. Sci. & Electron. Eng., Zhejiang Univ., Hangzhou, China
Abstract :
Chemical etching of sacrificial layers is a widely used technique in surface micromachining. The causes of the triangle at the etch front are analyzed. The viewpoint that stress is the major factor of the triangle´s formation is put forward. Through a study of the mechanism of the effects of annealing on etch rate, several rules about different annealing conditions having different effects on the etch rate are advanced.
Keywords :
annealing; etching; micromachining; annealing; chemical etching; etching profiles; sacrificial layers; surface micromachining; Annealing; Etching; Gravity; Machining; Microchannel; Microscopy; Plasma measurements; Plasma temperature; Stress; Tiles;
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
DOI :
10.1109/ICSICT.2004.1435196
