DocumentCode
435925
Title
A content-driven model-based OPC tool
Author
Yue, Ma ; Zheng, Shi ; Ye, Chen ; Xiaolang, Yan
Author_Institution
Inst. of VLSI Design, Zhejiang Univ., Hangzhou, China
Volume
2
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
1064
Abstract
With OPC technology´s wide usage in UDSM and nanometer scale IC manufacture today, new OPC tool with higher efficiency is demanded. In this paper, the framework of a new OPC tool is reported. Its layout content-aware dissection and correction flow along with the corresponding scripting commands are described as well. The performance of tool is demonstrated by experiments.
Keywords
integrated circuit manufacture; nanotechnology; photolithography; semiconductor device manufacture; IC manufacture; OPC tool; RET; UDSM; content-driven model; layout content-aware correction flow; layout content-aware dissection flow; nanometer scale; photolithography simulation; scripting command; Computational modeling; Costs; Etching; Lithography; Optical diffraction; Optical distortion; Optical scattering; Semiconductor device manufacture; Virtual manufacturing; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1436690
Filename
1436690
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