Title :
A two dimensional dynamic cellular automata model for simulation of photoresist etching process
Author :
Zhou, Zai-Fa ; Huang, Qing-An ; Li, Wei-Hua
Author_Institution :
Minist. of Educ., Southeast Univ., Nanjing, China
Abstract :
A two dimensional (2D) dynamic cellular automata (CA) model is presented for photoresist etching process simulation for the first time. In the dynamic CA model, only boundary cells are processed in pertinent etch step, so the simulation speed is greatly increased. The model has been tested using some well-known etch-rate distribution test functions and is found to be stable even in areas where the fluctuation in etch rates is very sharp.
Keywords :
cellular automata; etching; photoresists; boundary cells; dynamic CA model; dynamic cellular automata; etch-rate distribution test functions; photoresist etching process simulation; Computational modeling; Etching; Fabrication; Integrated circuit modeling; Lithography; Micromechanical devices; Optical imaging; Resists; Semiconductor device modeling; Testing;
Conference_Titel :
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN :
0-7803-8511-X
DOI :
10.1109/ICSICT.2004.1436693
