DocumentCode
435927
Title
A two dimensional dynamic cellular automata model for simulation of photoresist etching process
Author
Zhou, Zai-Fa ; Huang, Qing-An ; Li, Wei-Hua
Author_Institution
Minist. of Educ., Southeast Univ., Nanjing, China
Volume
2
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
1076
Abstract
A two dimensional (2D) dynamic cellular automata (CA) model is presented for photoresist etching process simulation for the first time. In the dynamic CA model, only boundary cells are processed in pertinent etch step, so the simulation speed is greatly increased. The model has been tested using some well-known etch-rate distribution test functions and is found to be stable even in areas where the fluctuation in etch rates is very sharp.
Keywords
cellular automata; etching; photoresists; boundary cells; dynamic CA model; dynamic cellular automata; etch-rate distribution test functions; photoresist etching process simulation; Computational modeling; Etching; Fabrication; Integrated circuit modeling; Lithography; Micromechanical devices; Optical imaging; Resists; Semiconductor device modeling; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1436693
Filename
1436693
Link To Document