DocumentCode
435931
Title
Simulation of etched profile based on singular point splitting algorithm
Author
Li, Yu ; Li, Ruiwei ; Wang, Jimin ; Fu, Yuxia
Author_Institution
Inst. of Microelectron., Tsinghua Univ., Beijing, China
Volume
2
fYear
2004
fDate
18-21 Oct. 2004
Firstpage
1096
Abstract
A singular point splitting algorithm which can simulate the two-dimensional etched profile with a singular point is put forward in this paper. Based on this algorithm, we establish a simulation model of etched profile which is close to the real etched profile to the greatest extent and we validate the simulation veracity via the result of process experiment.
Keywords
etching; etched profile simulation; singular point splitting algorithm; Acceleration; Anisotropic magnetoresistance; Application software; Computational modeling; Computer simulation; Etching; Plasma applications; Plasma simulation; Predictive models; Response surface methodology;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuits Technology, 2004. Proceedings. 7th International Conference on
Print_ISBN
0-7803-8511-X
Type
conf
DOI
10.1109/ICSICT.2004.1436702
Filename
1436702
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