Title :
Tailored InP-based quantum dash structures for ultra-wide gain bandwidth applications
Author :
Somers, A. ; Weichelt, Ch. ; Schwertberger, R. ; Reithmaier, J.P. ; Forchel, A.
Author_Institution :
Tech. Physik, Wurzburg Univ., Germany
fDate :
31 May-4 June 2004
Abstract :
Several InP based samples with a single InAs QDash layer embedded in In0.528Al0.238Ga0.234As were grown with various dash sizes to investigate the dependence of the emission intensity and wavelength on the dash layer thickness. Photoluminescence measurements at 8 K show a good control over the emission wavelength between 1.15 μm and 1.9 μm. In addition, uncapped QDash layers were grown to study the QDash formation by secondary electron microscopy. These results were used to combine four QDash layers with slightly different thicknesses to distribute the gain homogeneously over a larger spectral range. With this technique a flat gain profile of over 300 nm was confirmed by photoluminescence spectroscopy.
Keywords :
III-V semiconductors; aluminium compounds; electron microscopy; gallium arsenide; indium compounds; photoluminescence; semiconductor quantum dots; spectral line breadth; 1.15 to 1.9 mum; 8 K; InAs-In0.528Al0.238Ga0.234As; InP; dash layer thickness; emission intensity; gain profile; photoluminescence; secondary electron microscopy; tailored InP-based quantum dash structures; ultrawide gain bandwidth applications; Bandwidth; Indium phosphide; Optical buffering; Optical materials; Photoluminescence; Quantum dot lasers; Quantum dots; Quantum well lasers; Substrates; Temperature;
Conference_Titel :
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
Print_ISBN :
0-7803-8595-0
DOI :
10.1109/ICIPRM.2004.1442620