• DocumentCode
    436803
  • Title

    GaInAsP/InP multiple-quantum-wire lasers with narrow (14 nm) quantum-wire structure

  • Author

    Yagi, Hideki ; Sano, Takuya ; Ohira, Kazuya ; Miura, Koji ; Maruyama, Takeo ; Haque, Anisul ; Arai, Shigehisa

  • Author_Institution
    Res. Center for Quantum Effect Electron., Tokyo Inst. of Technol., Japan
  • fYear
    2004
  • fDate
    31 May-4 June 2004
  • Firstpage
    100
  • Lastpage
    103
  • Abstract
    GaInAsP/InP strain-compensated 5-stacked compressively strained quantum-wire lasers with the wire width of 14 nm in the period of 80 nm were realized by electron beam lithography, CH4/H2-reactive ion etching and two-step organometallic vapor-phase-epitaxial growth. By adopting completely strain-compensating barriers, a smaller energy blue shift at the peak wavelength in spontaneous emission spectra was obtained than that in the case of partial strain-compensation, indicating the suppression of strain relaxation in the active regions and the surrounding InP layers. A lateral quantum confinement effect could be observed via sharper shape of the spontaneous emission spectrum than that of quantum-film lasers in the higher transition energy region. Threshold current density of 1.46 kA/cm2 and differential quantum efficiency of 39% were also obtained under a pulsed condition at room temperature.
  • Keywords
    III-V semiconductors; MOCVD; arsenic compounds; compensation; current density; electron beam lithography; gallium arsenide; gallium compounds; indium compounds; infrared spectra; optical fabrication; quantum well lasers; semiconductor quantum wires; spectral line shift; spontaneous emission; sputter etching; vapour phase epitaxial growth; 14 nm; 39 percent; 80 nm; GaInAsP-InP; blue shift; differential quantum efficiency; electron beam lithography; multiple-quantum-wire lasers; quantum confinement effect; quantum-film lasers; quantum-wire structure; reactive ion etching; spontaneous emission spectra; strain relaxation; strain-compensating barriers; threshold current density; transition energy; two-step organometallic vapor-phase-epitaxial growth; Capacitive sensors; Electron beams; Etching; Indium phosphide; Laser transitions; Lithography; Potential well; Shape; Spontaneous emission; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8595-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2004.1442621
  • Filename
    1442621