DocumentCode
436803
Title
GaInAsP/InP multiple-quantum-wire lasers with narrow (14 nm) quantum-wire structure
Author
Yagi, Hideki ; Sano, Takuya ; Ohira, Kazuya ; Miura, Koji ; Maruyama, Takeo ; Haque, Anisul ; Arai, Shigehisa
Author_Institution
Res. Center for Quantum Effect Electron., Tokyo Inst. of Technol., Japan
fYear
2004
fDate
31 May-4 June 2004
Firstpage
100
Lastpage
103
Abstract
GaInAsP/InP strain-compensated 5-stacked compressively strained quantum-wire lasers with the wire width of 14 nm in the period of 80 nm were realized by electron beam lithography, CH4/H2-reactive ion etching and two-step organometallic vapor-phase-epitaxial growth. By adopting completely strain-compensating barriers, a smaller energy blue shift at the peak wavelength in spontaneous emission spectra was obtained than that in the case of partial strain-compensation, indicating the suppression of strain relaxation in the active regions and the surrounding InP layers. A lateral quantum confinement effect could be observed via sharper shape of the spontaneous emission spectrum than that of quantum-film lasers in the higher transition energy region. Threshold current density of 1.46 kA/cm2 and differential quantum efficiency of 39% were also obtained under a pulsed condition at room temperature.
Keywords
III-V semiconductors; MOCVD; arsenic compounds; compensation; current density; electron beam lithography; gallium arsenide; gallium compounds; indium compounds; infrared spectra; optical fabrication; quantum well lasers; semiconductor quantum wires; spectral line shift; spontaneous emission; sputter etching; vapour phase epitaxial growth; 14 nm; 39 percent; 80 nm; GaInAsP-InP; blue shift; differential quantum efficiency; electron beam lithography; multiple-quantum-wire lasers; quantum confinement effect; quantum-film lasers; quantum-wire structure; reactive ion etching; spontaneous emission spectra; strain relaxation; strain-compensating barriers; threshold current density; transition energy; two-step organometallic vapor-phase-epitaxial growth; Capacitive sensors; Electron beams; Etching; Indium phosphide; Laser transitions; Lithography; Potential well; Shape; Spontaneous emission; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
ISSN
1092-8669
Print_ISBN
0-7803-8595-0
Type
conf
DOI
10.1109/ICIPRM.2004.1442621
Filename
1442621
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