Title :
Multi-user hybrid process platform for MEMS devices using silicon-on-insulator wafers
Author :
Lin, P. ; Boysel, R.M. ; Boysel, M. ; Winters, M. ; Hawkins, W. ; Kubby, J. ; Gulvin, P. ; Diehl, J. ; Feinberg, K. ; German, K. ; Herko, L. ; Jia, N. ; Ma, J. ; Meyers, J. ; Nystrom, P. ; Wang, Y.R.
Author_Institution :
Infotonics Technol. Center, Canandaigua, NY, USA
fDate :
30 Jan.-3 Feb. 2005
Abstract :
A new multi-user hybrid surface and bulk micromachining process on silicon-on-insulator (SOI) wafers is discussed. This 13-mask process consists of a doped polysilicon layer for electrical connection and non-critical structures and a single crystal silicon (SCS) layer for excellent optical and mechanical properties in the critical MEMS design. There are 7 masks for doping and etching of the SCS layer. The flexibility and versatility of this process allows for microsystems designs such as actuators, optical gratings, and dimples/anchors on the SCS layer. The MEMS devices fabricated and tested in this paper include thermal actuators, hinges, latches, optical switches, mirrors, and waveguides.
Keywords :
actuators; diffraction gratings; etching; micromachining; micromechanical devices; micromirrors; optical switches; silicon-on-insulator; 13-mask process; MEMS design; MEMS devices; SCS layer anchors; SCS layer dimples; bulk micromachining process; doped polysilicon layer; doping; etching; hinges; latches; microsystems designs; mirrors; multi user hybrid process platform; optical gratings; optical switches; silicon-on-insulator wafers; single crystal silicon layer; thermal actuators; waveguides; Actuators; Doping; Mechanical factors; Microelectromechanical devices; Micromachining; Micromechanical devices; Optical design; Optical surface waves; Optical waveguides; Silicon on insulator technology;
Conference_Titel :
Micro Electro Mechanical Systems, 2005. MEMS 2005. 18th IEEE International Conference on
Print_ISBN :
0-7803-8732-5
DOI :
10.1109/MEMSYS.2005.1453980
