• DocumentCode
    437318
  • Title

    Control of selective and blanket ruthenium film deposition chemistry in supercritical CO2 fluid chemical deposition

  • Author

    Kondoh, Eiichi

  • fYear
    2004
  • fDate
    Oct. 27-29, 2004
  • Firstpage
    48
  • Lastpage
    49
  • Keywords
    Chemical engineering; Chemistry; Dielectric thin films; Oxidation; Semiconductor thin films; Solvents; Sputtering; Surface tension; Surface topography; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
  • Print_ISBN
    4-99024720-5
  • Type

    conf

  • DOI
    10.1109/IMNC.2004.245715
  • Filename
    1459465
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=437318