DocumentCode :
437322
Title :
Proposal of large exposure area and wide dimensional X-ray lithography for liga process using energy variable synchrotron radiation
Author :
Utsumi, Yuichi ; Kishimoto, Takefumi ; Hattori, Tadashi ; Hara, Hirotsugu
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
104
Lastpage :
105
Keywords :
Fabrication; Microstructure; Proposals; Resists; Shape; Storage rings; Strontium; Substrates; Synchrotron radiation; X-ray lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245745
Filename :
1459495
Link To Document :
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