Title :
Edge effects on plasmonic nanolithography
Author :
Luo, Xiangang ; Ishihara, Teruya
Keywords :
Apertures; Diffraction; Finite difference methods; Interference; Lighting; Lithography; Nanolithography; Plasmons; Protection; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
DOI :
10.1109/IMNC.2004.245759
