Edge effects on plasmonic nanolithography

Author

Luo, Xiangang ; Ishihara, Teruya

fYear

2004

fDate

Oct. 27-29, 2004

Firstpage

132

Lastpage

133

Keywords

Apertures; Diffraction; Finite difference methods; Interference; Lighting; Lithography; Nanolithography; Plasmons; Protection; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN

4-99024720-5

Type

DOI

10.1109/IMNC.2004.245759

Filename

1459509

Link To Document