DocumentCode :
437326
Title :
UV nanoimprint lithography using a large area stamp in a low vacuum environment
Author :
Lee, Eung-Sug ; Jeong, Jun-Ho ; Young-suk Sm ; Sohn, Hyonkee ; Shin, Young-Jae ; Choi, Dae-Geun
fYear :
2004
fDate :
Oct. 27-29, 2004
Firstpage :
140
Lastpage :
141
Keywords :
Machine intelligence; Machinery; Nanofabrication; Nanolithography; Pressing; Resins; Temperature; Textile industry; Ultraviolet sources; Vacuum technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN :
4-99024720-5
Type :
conf
DOI :
10.1109/IMNC.2004.245763
Filename :
1459513
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=437326
