مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

437337

Title :

Advances of EUV interferometry in EUVA

Author :

Ouchi, Chidane ; Hasegawa, Masanobu ; Kato, Seima ; Suzuki, Akiyoshi ; Sugisaki, Katsumi ; Okada, Masashi ; Saito, Jun ; Murakami, Katsuhiko ; Niibe, Masahito ; Takeda, Mitsuo

fYear :

2004

fDate :

Oct. 27-29, 2004

Firstpage :

286

Lastpage :

287

Keywords :

Assembly systems; Diffraction; Gratings; Laboratories; Large scale integration; Lithography; Metrology; Optical interferometry; Shearing; Ultraviolet sources;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN :

4-99024720-5

Type :

conf

DOI :

10.1109/IMNC.2004.245655

Filename :

1459589

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=437337