DocumentCode
438171
Title
CPP spin-valves utilizing ultra-strong Ir coupled antiparallel pinned layers for thick reference layer stabilization
Author
Maat, Stefan ; Carey, Matthew ; Kaline, J.A. ; Childress, J.R.
Author_Institution
San Jose Res. Center, Hitachi Global Storage Technol., San Jose, CA, USA
fYear
2005
fDate
4-8 April 2005
Firstpage
17
Lastpage
18
Abstract
The magneto-resistance (ΔR/R) of a current-perpendicular-to-the-plane (CPP) spin-valve sensor with an anti-parallel (AP) coupled pinned layer can be increased by increasing the thickness of its reference ferromagnetic layer (AP2) close to the spin-diffusion length of the material employed within AP2 in order to generate more bulk electron spin scattering. However ultra-strong antiferromagnetic coupling is required to maintain a high saturation field in the AP coupled structure, which is one criterion for a stable sensor. We found that Ir coupled anti-parallel (AP) pinned structures can be prepared with an extremely high coupling allowing us to increase the thickness of both the pinned layer,(AP1) and AP2 to more than 100 Å while maintaining both high saturation fields and a balanced AP-pinned structure. Annealing was done at 225°C for 4 hours and the hysteresis loops of the annealed Ta(50)/NiFe(35)/CoFe10(50)/Ir(6)/CoFe10(50)/Ru(50)/Ta(25) sample and the as-deposited sample were compared which showed that Ir coupled structures are unstable against thermal annealing. We grew metallic Ir AP coupled self-pinned CPP spin valves structure which did not require annealing and patterned them into pillars using electron beam lithography and ion milling. The magnetoresistance increased with AP2 layer thickness.
Keywords
annealing; antiferromagnetic materials; cobalt alloys; electron beam lithography; enhanced magnetoresistance; ferromagnetic materials; ion beam effects; iridium; iron alloys; magnetic hysteresis; magnetic multilayers; magnetic thin films; milling; nickel alloys; ruthenium; spin dynamics; spin valves; tantalum; 225 degC; 4 hour; CPP spin-valve sensor; Ta-NiFe-CoFe10-Ir-CoFe10-Ru-Ta; annealing; bulk electron spin scattering; current-perpendicular-to-the-plane spin-valve sensor; electron beam lithography; hysteresis loops; ion milling; magnetoresistance; reference ferromagnetic layer; saturation field; spin-diffusion length; thick reference layer stabilization; ultra-strong Ir coupled antiparallel pinned layers; ultra-strong antiferromagnetic coupling; Annealing; Antiferromagnetic materials; Electrons; Hysteresis; Magnetic materials; Magnetic sensors; Optical coupling; Saturation magnetization; Scattering; Spin valves;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1463437
Filename
1463437
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