DocumentCode
438255
Title
Absence of weak electron localization in ferromagnetic Co nanowires
Author
Brands, M. ; Carl, A. ; Dumpich, G.
Author_Institution
Exp., Duisburg Univ., Germany
fYear
2005
fDate
4-8 April 2005
Firstpage
929
Lastpage
930
Abstract
Co nanowires are fabricated by standard electron beam lithography (EBL) and lift-off technique and by subsequent electron beam evaporation of Co. Some of the wires are covered with either Pt or C in order to prevent oxidation. Magentoresistance measurements are carried out in a He bath-cryostat with applied magnetic fields of up to B = 5.0 T in out-of-plane direction. Structural investigations reveal that the Co-wires have a polycrystalline morphology. Electron diffraction patterns indicate the predominance of hexagonal close packed (HCP) Co. Magnetic force microscopy (MFM) investigations show that all Co-wires are in a single-domain state at remanence with the magnetization lying in-plane along the long wire axis due to their strong shape anisotropy.
Keywords
cobalt; crystal morphology; diffusion; electron beam lithography; electron diffraction; ferromagnetic materials; magnetic force microscopy; magnetoresistance; nanowires; remanence; vacuum deposition; 5.0 T; C; Co; Pt; electron beam evaporation; electron beam lithography; electron diffraction pattern; ferromagnetic Co nanowire; hexagonal close packed Co; lift-off technique; magnetic force microscopy; magnetization; magnetoresistance; polycrystalline morphology; remanence; shape anisotropy; single domain state; weak electron localization; Diffraction; Electron beams; Helium; Lithography; Magnetic field measurement; Magnetic force microscopy; Morphology; Nanowires; Oxidation; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1463893
Filename
1463893
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