Title :
Properties of half-metallic double-perovskite thin films
Author :
Asano, H. ; Koduka, N. ; Imaeda, K. ; Sugiyama, M. ; Matsui, M.
Author_Institution :
Dept. of Crystalline Mater. Sci., Nagoya Univ., Japan
Abstract :
This paper reports the magnetic, and electrical properties of epitaxial thin films with an ordered double-perovskite structure. High-quality Sr2FeMoO6 (SFMO) and Sr2CrReO6 (SCRO) films have been grown by sputtering onto the completely lattice-matched substrates of Ba0.4Sr0.6TiO3-buffered and bare SrTiO3, respectively. These films exhibit high saturation magnetization Ms values (3.8 μB/f.u. for SFMO and 0.9 μB/f.u. for SCRO), which are close to the expected values for their half-metallicity, and high-Tc values (385 K for SFMO and 620 K for SCRO). The atomically flat surfaces free from any surface precipitate enable us to employ a standard photolithographic process for fabricating magnetic tunnel junctions based on these films. Magnetic tunnel junctions are completed with a native barrier formed by surface oxidation of a base-electrode film and a Co counterelectrode, showing 10% tunnel magnetoresistance (TMR) ratio at 4.2 K for a SFMO film.
Keywords :
chromium compounds; iron compounds; magnetic epitaxial layers; magnetisation; oxidation; photolithography; semimetallic thin films; sputter deposition; strontium compounds; tunnelling magnetoresistance; 4.2 K; Ba0.4Sr0.6TiO3; Sr2CrReO6-Co; Sr2FeMoO6-Co; SrTiO3; atomically flat surfaces; base-electrode film; counterelectrode; double-perovskite thin films; electrical properties; epitaxial thin films; half-metallicity; lattice-matched substrates; magnetic properties; magnetic tunnel junctions; photolithographic process; saturation magnetization; sputtering; surface oxidation; tunnel magnetoresistance; Magnetic films; Magnetic properties; Magnetic tunneling; Oxidation; Saturation magnetization; Sputtering; Strontium; Substrates; Transistors; Tunneling magnetoresistance;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1464375