DocumentCode
439109
Title
Multivariable predictive control of thin film deposition using a stochastic PDE model
Author
Ni, Dong ; Christofides, Panagiotis D.
Author_Institution
Dept. of Chem. Eng., California Univ., Los Angeles, CA, USA
fYear
2005
fDate
8-10 June 2005
Firstpage
3096
Abstract
In this work, we construct a 2-dimensional (2D) stochastic partial differential equation (PDE) model for a thin film deposition process and design a multivariable predictive controller based on the constructed model to control thin film thickness and surface roughness. We focus on a thin film deposition process governed by three microscopic processes including molecule adsorption, migration and desorption. A 2D linear stochastic PDE model is initially constructed following the methodology proposed in our previous work [Ni, D. and Christofides, P. D., 2005]. Then, a stochastic PDE model-based multivariable controller is designed using the constructed stochastic PDE model. The control problem is formulated as a predictive control problem, in which the constructed stochastic PDE model is used to predict both the thin film thickness and the surface roughness. Moreover, the controller design is performed based on a finite stochastic ordinary differential equation (ODE) approximation of the stochastic PDE model to achieve high computational efficiency. The model-based predictive controller is applied to the kinetic Monte-Carlo (kMC) simulation of the deposition process to simultaneously control the thin film thickness and surface roughness. Closed-loop system simulation results demonstrate that the model is adequately accurate and that the controller is effective.
Keywords
Monte Carlo methods; chemical vapour deposition; closed loop systems; coatings; multivariable control systems; partial differential equations; predictive control; process control; stochastic processes; surface roughness; thickness control; thin films; closed-loop system; finite stochastic ordinary differential equation approximation; kinetic Monte-Carlo simulation; molecule adsorption; molecule desorption; molecule migration; multivariable predictive control; partial differential equation; stochastic PDE model; surface roughness control; thin film deposition; thin film thickness control; Computational modeling; Partial differential equations; Predictive control; Predictive models; Process design; Rough surfaces; Sputtering; Stochastic processes; Surface roughness; Thickness control;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 2005. Proceedings of the 2005
ISSN
0743-1619
Print_ISBN
0-7803-9098-9
Electronic_ISBN
0743-1619
Type
conf
DOI
10.1109/ACC.2005.1470447
Filename
1470447
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