• DocumentCode
    439281
  • Title

    Low power SOI CMOS multipliers : 2D vs. 3D

  • Author

    Guyot, A.

  • fYear
    1998
  • fDate
    22-24 Sept. 1998
  • Firstpage
    196
  • Lastpage
    199
  • Abstract
    In this paper a new three-dimensional SOI on SOI technology is presented, then design methodologies are proposed for this technology and last, a comparison is carried out between 2D and 3D designs. Here, the P-channel devices are stacked over the N-channel ones. All gates are 0.1µm length. New design constraints are introduced. Consequently, new design methodologies and tools have to be developed in order to take advantage of the reduced length of interconnections. A 16×16 bit multiplier was designed in this technology. Comparative results between 2D and 3D integration are given in terms of energy consumption, performance, delay and area.
  • Keywords
    Delay; Design methodology; Energy consumption; Etching; Laboratories; Lithography; Microelectronics; Network topology; Silicon on insulator technology; Space technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 1998. ESSCIRC '98. Proceedings of the 24th European
  • Type

    conf

  • DOI
    10.1109/ESSCIR.1998.186242
  • Filename
    1470999