DocumentCode
439281
Title
Low power SOI CMOS multipliers : 2D vs. 3D
Author
Guyot, A.
fYear
1998
fDate
22-24 Sept. 1998
Firstpage
196
Lastpage
199
Abstract
In this paper a new three-dimensional SOI on SOI technology is presented, then design methodologies are proposed for this technology and last, a comparison is carried out between 2D and 3D designs. Here, the P-channel devices are stacked over the N-channel ones. All gates are 0.1µm length. New design constraints are introduced. Consequently, new design methodologies and tools have to be developed in order to take advantage of the reduced length of interconnections. A 16×16 bit multiplier was designed in this technology. Comparative results between 2D and 3D integration are given in terms of energy consumption, performance, delay and area.
Keywords
Delay; Design methodology; Energy consumption; Etching; Laboratories; Lithography; Microelectronics; Network topology; Silicon on insulator technology; Space technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 1998. ESSCIRC '98. Proceedings of the 24th European
Type
conf
DOI
10.1109/ESSCIR.1998.186242
Filename
1470999
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