DocumentCode :
439915
Title :
Conductance of MOS transistors in saturation
Author :
Frohman-Bentchkowsky, D. ; Grove, A.S.
Volume :
13
fYear :
1967
fDate :
1967
Firstpage :
22
Lastpage :
24
Abstract :
The finite output conductance of MOS transistors operating in the saturation region is generally attributed to the spreading of the depletion region near the drain which results in a reduction of the channel length. Previous treatments have attempted to calculate the extent of this spreading by describing the electric field distribution using step p-n junction theory. It is shown in this work that the experimentally observed output conductance can be in gross disagreement with such calculations. This discrepancy is due to the fact that, owing to the presence of the gate electrode, the electric field in the drain depletion region is greatly increased.
Keywords :
Doping; Impurities; Insulation; Laboratories; Length measurement; MOSFETs; P-n junctions; Substrates; Thickness measurement; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1967 International
Conference_Location :
IEEE
Type :
conf
Filename :
1474861
Link To Document :
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