DocumentCode :
440000
Title :
Pathways and pitfalls in device lithography
Author :
Gordon, E.I.
Volume :
21
fYear :
1975
fDate :
1975
Firstpage :
3
Lastpage :
5
Abstract :
The device engineer, working in silicon integrated circuits, bubble memory, microwave devices and other emerging areas consistently finds that pattern generation sets major limits on his ability to achieve higher complexity, higher performance, lower cost, greater reliability and faster design turnaround time. As a consequence major efforts are being directed to pattern generation technology. The motivation for the various activities will be examined and reviewed, and an attempt will be made to assess the relevance of these activities, pointing out potential pitfalls or areas that should be considered early in the technology development.
Keywords :
Costs; Design engineering; Integrated circuit reliability; Integrated circuit technology; Lithography; Microwave devices; Microwave generation; Microwave integrated circuits; Reliability engineering; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1975 International
Conference_Location :
IEEE
Type :
conf
Filename :
1478172
Link To Document :
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