• DocumentCode
    440003
  • Title

    Laser scanning IC mask inspection system

  • Author

    Knox, J.D.

  • Volume
    21
  • fYear
    1975
  • fDate
    1975
  • Firstpage
    24
  • Lastpage
    26
  • Abstract
    The increased demands placed by LSI for further integrated circuit miniaturization has correspondingly increased the importance of a defect free mask. The purpose of this paper is to describe an optical system based on laser scanning techniques which will rapidly locate integrated circuit mask defects. An optical arrangement has also been incorporated which permits the operator to differentiate between various type defects and thus classify them.
  • Keywords
    Acoustic beams; Inspection; Laser beams; Light scattering; Monitoring; Optical scattering; Particle scattering; Probes; Surface contamination; TV;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1975 International
  • Conference_Location
    IEEE
  • Type

    conf

  • Filename
    1478177