DocumentCode
440004
Title
Characterization of plasma-etching for semiconductor applications
Author
Kumar, Ravindra
Volume
21
fYear
1975
fDate
1975
Firstpage
27
Lastpage
28
Keywords
Chemicals; Conducting materials; Crystalline materials; Etching; Fluid flow; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1975 International
Conference_Location
IEEE
Type
conf
Filename
1478178
Link To Document