• DocumentCode
    440050
  • Title

    GaAs1-xSbx1.06 µm avalanche photodiodes

  • Author

    Scholl, F.W. ; Nakano, K. ; Eden, R.C.

  • Author_Institution
    Rockwell International, Thousand Oaks, California
  • fYear
    1976
  • fDate
    6-8 Dec. 1976
  • Firstpage
    424
  • Lastpage
    425
  • Abstract
    Progress toward achieving high gain, avalanche photodiodes operating at 1.06µm is described. 1.06µm photodiodes have been fabricated (3 mil × 3 mil) with average gain of >14 at a leakage current of 150 na. These devices are fabricated from GaAs1-xSbxmaterial grown by LPE on GaAs substrates. Multiple layer step graded structures are used to reduce stress in the active layers. A self-terminated depletion region design has been found to give significant improvement in gain uniformity.
  • Keywords
    Avalanche photodiodes; Dark current; Electric breakdown; Fluctuations; Gallium arsenide; Leakage current; Optical materials; Optical receivers; P-n junctions; Photonic band gap;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1976 International
  • Conference_Location
    Washigton, DC, USA
  • Type

    conf

  • DOI
    10.1109/IEDM.1976.189073
  • Filename
    1478785