DocumentCode
440050
Title
GaAs1-xSbx1.06 µm avalanche photodiodes
Author
Scholl, F.W. ; Nakano, K. ; Eden, R.C.
Author_Institution
Rockwell International, Thousand Oaks, California
fYear
1976
fDate
6-8 Dec. 1976
Firstpage
424
Lastpage
425
Abstract
Progress toward achieving high gain, avalanche photodiodes operating at 1.06µm is described. 1.06µm photodiodes have been fabricated (3 mil × 3 mil) with average gain of >14 at a leakage current of 150 na. These devices are fabricated from GaAs1-x Sbx material grown by LPE on GaAs substrates. Multiple layer step graded structures are used to reduce stress in the active layers. A self-terminated depletion region design has been found to give significant improvement in gain uniformity.
Keywords
Avalanche photodiodes; Dark current; Electric breakdown; Fluctuations; Gallium arsenide; Leakage current; Optical materials; Optical receivers; P-n junctions; Photonic band gap;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1976 International
Conference_Location
Washigton, DC, USA
Type
conf
DOI
10.1109/IEDM.1976.189073
Filename
1478785
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