Title :
GaAs1-xSbx1.06 µm avalanche photodiodes
Author :
Scholl, F.W. ; Nakano, K. ; Eden, R.C.
Author_Institution :
Rockwell International, Thousand Oaks, California
Abstract :
Progress toward achieving high gain, avalanche photodiodes operating at 1.06µm is described. 1.06µm photodiodes have been fabricated (3 mil × 3 mil) with average gain of >14 at a leakage current of 150 na. These devices are fabricated from GaAs1-xSbxmaterial grown by LPE on GaAs substrates. Multiple layer step graded structures are used to reduce stress in the active layers. A self-terminated depletion region design has been found to give significant improvement in gain uniformity.
Keywords :
Avalanche photodiodes; Dark current; Electric breakdown; Fluctuations; Gallium arsenide; Leakage current; Optical materials; Optical receivers; P-n junctions; Photonic band gap;
Conference_Titel :
Electron Devices Meeting, 1976 International
Conference_Location :
Washigton, DC, USA
DOI :
10.1109/IEDM.1976.189073