• DocumentCode
    440229
  • Title

    Co-Silicide Junction Leakage and Device Characteristics in Embedded DRAM with Stack Capacitor Structure

  • Author

    Kim, Jong-Chaen ; Lee, Wook-Ha ; Kim, Jin-Gu ; Chung, Shin-Young ; Nam, Jeong-Suk ; Lee, Jong-Lim ; Kim, Hongseog ; Song, Duheon

  • Author_Institution
    LG Semicon Co. Ltd., Cheongju, Korea
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    228
  • Lastpage
    231
  • Keywords
    Capacitors; Degradation; Dielectric materials; Diodes; Heat treatment; Leakage current; Logic arrays; MOSFETs; Random access memory; Silicides;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505481