DocumentCode
440229
Title
Co-Silicide Junction Leakage and Device Characteristics in Embedded DRAM with Stack Capacitor Structure
Author
Kim, Jong-Chaen ; Lee, Wook-Ha ; Kim, Jin-Gu ; Chung, Shin-Young ; Nam, Jeong-Suk ; Lee, Jong-Lim ; Kim, Hongseog ; Song, Duheon
Author_Institution
LG Semicon Co. Ltd., Cheongju, Korea
Volume
1
fYear
1999
fDate
13-15 Sept. 1999
Firstpage
228
Lastpage
231
Keywords
Capacitors; Degradation; Dielectric materials; Diodes; Heat treatment; Leakage current; Logic arrays; MOSFETs; Random access memory; Silicides;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location
Leuven, Belgium
Print_ISBN
2-86332-245-1
Type
conf
Filename
1505481
Link To Document