Gate Stack Optimisation for Advanced CMOS Process

Author

Kubicek, S. ; Vandenberghe, G. ; Schaekers, M. ; Kold´yaev, V. ; Jansen, P. ; Badenes, G. ; Deferm, L. ; De Meyer, K. ; Kerr, D. ; Naem, A.

Author_Institution

IMEC, Leuven, Belgium

Volume

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

412

Lastpage

415

Keywords

CMOS process; CMOS technology; Capacitors; Chemical technology; Dielectrics; Isolation technology; Lithography; MOS devices; MOSFETs; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

Filename

1505527

Link To Document