Optimisation of Critical Parameters in a Low Cost, High Performance Deep Submicron CMOS Technology

Author

Badenes, G. ; Perelló, C. ; Rupp, A. ; Vandamme, E. ; Augendre, E. ; Pochet, S. ; Deferm, L.

Author_Institution

IMEC, Leuven, Belgium

Volume

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

628

Lastpage

631

Keywords

Annealing; CMOS technology; Continuous improvement; Cost function; Doping profiles; Frequency; Implants; MOS devices; Scalability; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

Filename

1505581

Link To Document