• DocumentCode
    440308
  • Title

    Effects of Ge Preamorphization on the Specific Contact Resistance of TiSi2 to Silicon

  • Author

    Melick, N. G H Van ; Kaiser, M. ; Montree, A.H.

  • Author_Institution
    Philips Research Laboratories, Eindhoven, The Netherlands
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    640
  • Lastpage
    643
  • Keywords
    Artificial intelligence; CMOS process; Contact resistance; Electrical resistance measurement; Implants; Laboratories; Silicides; Silicon; Surface resistance; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505584
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=440308