DocumentCode
443253
Title
Variation of flash memory threshold voltage correlated with applied voltage slope in Fowler Nordheim erase mode
Author
Bouquet, Valery ; Canet, Pierre ; Lalande, Frédéric ; Devin, Jean ; Leconte, Bruno ; Mariéma, Nicolas
Author_Institution
IMT Technopole de Chateau Gombert, L2MP-UMR CNRS, Marseille, France
Volume
1
fYear
2005
fDate
25-28 July 2005
Firstpage
86
Abstract
In order to pre-evaluate the necessary time needed to write a flash cell memory, we use a simplified expression for the Fowler Nordheim injecting current during the erase mode, which allows us to find a relationship between the applied voltages and the resulting threshold voltage. We show in this study that the absolute value of the derivative of the threshold voltage is equal to the positive signal slope applied on the control gate. We validate this assumption by measurements on samples provided by STmicroelectronics.
Keywords
flash memories; Fowler Nordheim injecting current; STmicroelectronics; erase mode; flash memory; threshold voltage; Capacitance; Channel hot electron injection; Character generation; Equations; Flash memory; Nonvolatile memory; Radiofrequency interference; Silicon; Threshold voltage; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Research in Microelectronics and Electronics, 2005 PhD
Print_ISBN
0-7803-9345-7
Type
conf
DOI
10.1109/RME.2005.1543009
Filename
1543009
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