• DocumentCode
    443253
  • Title

    Variation of flash memory threshold voltage correlated with applied voltage slope in Fowler Nordheim erase mode

  • Author

    Bouquet, Valery ; Canet, Pierre ; Lalande, Frédéric ; Devin, Jean ; Leconte, Bruno ; Mariéma, Nicolas

  • Author_Institution
    IMT Technopole de Chateau Gombert, L2MP-UMR CNRS, Marseille, France
  • Volume
    1
  • fYear
    2005
  • fDate
    25-28 July 2005
  • Firstpage
    86
  • Abstract
    In order to pre-evaluate the necessary time needed to write a flash cell memory, we use a simplified expression for the Fowler Nordheim injecting current during the erase mode, which allows us to find a relationship between the applied voltages and the resulting threshold voltage. We show in this study that the absolute value of the derivative of the threshold voltage is equal to the positive signal slope applied on the control gate. We validate this assumption by measurements on samples provided by STmicroelectronics.
  • Keywords
    flash memories; Fowler Nordheim injecting current; STmicroelectronics; erase mode; flash memory; threshold voltage; Capacitance; Channel hot electron injection; Character generation; Equations; Flash memory; Nonvolatile memory; Radiofrequency interference; Silicon; Threshold voltage; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Research in Microelectronics and Electronics, 2005 PhD
  • Print_ISBN
    0-7803-9345-7
  • Type

    conf

  • DOI
    10.1109/RME.2005.1543009
  • Filename
    1543009