• DocumentCode
    443931
  • Title

    The effect of dislocation loops on the light emission of silicon LEDs

  • Author

    Hoang, T. ; LeMinh, P. ; Holleman, J. ; Schmitz, J.

  • Author_Institution
    MESA+ Res. Inst., Twente Univ., Enschede, Netherlands
  • fYear
    2005
  • fDate
    12-16 Sept. 2005
  • Firstpage
    359
  • Lastpage
    362
  • Abstract
    Recently, different and apparently contradicting results were published regarding the influence of crystal defects on the light emission efficiency of silicon LEDs at room temperature (Wai Lek Ng). In this paper we report our results on light emission of silicon p+n diodes with various defect engineering approaches. The p+ region was formed either by ion implantation or by diffusion; and optionally, additional lattice damage was created by silicon ion implantation. The experiments clearly indicate that lattice defects have a detrimental effect on light emission, contrary to the results published in recent years.
  • Keywords
    crystal defects; elemental semiconductors; failure analysis; ion implantation; light emitting diodes; p-n junctions; semiconductor device breakdown; silicon; Si; crystal defects; defect engineering approach; diffusion; dislocation loops; ion implantation; lattice damage; lattice defects; light emission efficiency; p+n diodes; silicon LED; Annealing; Boron; Implants; Ion implantation; Lattices; Light emitting diodes; Photonic band gap; Radiative recombination; Silicon; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
  • Print_ISBN
    0-7803-9203-5
  • Type

    conf

  • DOI
    10.1109/ESSDER.2005.1546659
  • Filename
    1546659