DocumentCode
443931
Title
The effect of dislocation loops on the light emission of silicon LEDs
Author
Hoang, T. ; LeMinh, P. ; Holleman, J. ; Schmitz, J.
Author_Institution
MESA+ Res. Inst., Twente Univ., Enschede, Netherlands
fYear
2005
fDate
12-16 Sept. 2005
Firstpage
359
Lastpage
362
Abstract
Recently, different and apparently contradicting results were published regarding the influence of crystal defects on the light emission efficiency of silicon LEDs at room temperature (Wai Lek Ng). In this paper we report our results on light emission of silicon p+n diodes with various defect engineering approaches. The p+ region was formed either by ion implantation or by diffusion; and optionally, additional lattice damage was created by silicon ion implantation. The experiments clearly indicate that lattice defects have a detrimental effect on light emission, contrary to the results published in recent years.
Keywords
crystal defects; elemental semiconductors; failure analysis; ion implantation; light emitting diodes; p-n junctions; semiconductor device breakdown; silicon; Si; crystal defects; defect engineering approach; diffusion; dislocation loops; ion implantation; lattice damage; lattice defects; light emission efficiency; p+n diodes; silicon LED; Annealing; Boron; Implants; Ion implantation; Lattices; Light emitting diodes; Photonic band gap; Radiative recombination; Silicon; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
Print_ISBN
0-7803-9203-5
Type
conf
DOI
10.1109/ESSDER.2005.1546659
Filename
1546659
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