DocumentCode :
44408
Title :
Measurement and Parameterization of Carrier Mobility Sum in Silicon as a Function of Doping, Temperature and Injection Level
Author :
Zheng, P. ; Rougieux, Fiacre E. ; Macdonald, Daniel ; Cuevas, Andres
Author_Institution :
Res. Sch. of Eng., Australian Nat. Univ., Canberra, ACT, Australia
Volume :
4
Issue :
2
fYear :
2014
fDate :
Mar-14
Firstpage :
560
Lastpage :
565
Abstract :
Based on contactless photoconductance measurements of silicon wafers, we have determined the sum of the electron and hole mobilities as a function of doping, excess carrier concentration, and temperature. By separately analyzing those three functional dependences, we then develop a simple mathematical expression to describe the mobility sum as a function of carrier injection wafer doping and temperature from 150 to 450 K. This new parameterization also provides experimental validation to Klaassen´s and Dorkel-Leturcq´s mobility models in a range of temperatures.
Keywords :
charge injection; electron density; electron mobility; elemental semiconductors; hole density; hole mobility; phosphorus; photoconductivity; semiconductor doping; silicon; Dorkel-Leturcq mobility model; Klaassen mobility model; Si:P; carrier concentration; carrier injection wafer doping; carrier mobility sum; contactless photoconductance measurement; electron mobility sum; functional dependence; hole mobility sum; injection level; silicon wafers; temperature 150 K to 450 K; Charge carrier density; Doping; Scattering; Semiconductor process modeling; Silicon; Temperature dependence; Temperature measurement; Charge carrier mobility; mobility sum; silicon; temperature and injection dependent;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2013.2294755
Filename :
6698347
Link To Document :
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