DocumentCode
444272
Title
Time-resolved X-ray absorption fine structure measurement of laser-melted Si with femtosecond laser-produced-plasma X-ray source
Author
Oguri, Katsuya ; Okano, Yasuaki ; Nishikawa, Tadashi ; Nakano, Hidetoshi
Author_Institution
NTT Basic Res. Labs., NTT Corp., Atsugi, Japan
Volume
2
fYear
2005
fDate
22-27 May 2005
Firstpage
751
Abstract
We describe the picosecond time-resolved measurement of the X-ray absorption fine structure in laser-melted Si by using a femtosecond laser-produced-plasma soft X-ray source and report that the Si-Si atomic distance broadened due to the melting.
Keywords
X-ray absorption; fine structure; high-speed optical techniques; plasma X-ray sources; plasma production by laser; Si; Si-Si atomic distance; X-ray absorption; femtosecond laser-produced-plasma; fine structure; laser-melted Si; picosecond time-resolved measurement; soft X-ray source; Atom lasers; Atomic measurements; Electromagnetic wave absorption; Optical pulses; Pulse measurements; Surface emitting lasers; Ultrafast electronics; Ultrafast optics; X-ray diffraction; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Print_ISBN
1-55752-796-2
Type
conf
DOI
10.1109/QELS.2005.1548926
Filename
1548926
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