Title :
Femtosecond laser ablation of silicon (100) with thermal oxide thin films of varying thickness
Author :
McDonald, Joel P. ; Ray, Katherine E. ; Mistry, Vanita R. ; Mourou, Gérard ; Yalisove, Steven M.
Author_Institution :
Dept. of Electr. Eng., Michigan Univ., Ann Arbor, MI, USA
Abstract :
Femtosecond laser ablation of silicon (100) with thermal oxide thin films was studied in order to further understand the ablative properties of thin films and to evaluate their influence on the ablation of the substrate.
Keywords :
high-speed optical techniques; laser ablation; semiconductor thin films; silicon compounds; Si-SiO2; amorphous material; femtosecond laser ablation; glass; silicon; thermal oxide thin film; Laser ablation; Laser beams; Laser theory; Optical films; Optical pulses; Semiconductor thin films; Silicon; Surface emitting lasers; Surface morphology; Ultrafast optics;
Conference_Titel :
Quantum Electronics and Laser Science Conference, 2005. QELS '05
Print_ISBN :
1-55752-796-2
DOI :
10.1109/QELS.2005.1548979
