DocumentCode :
445380
Title :
Integration of III-V nanowires in Si technology
Author :
Wunnicke, O. ; Serafin, S.N. ; van Kouwen, M.P. ; Roest, A.L. ; Bakkers, E. P A M
Volume :
1
fYear :
2005
fDate :
June 20-22, 2005
Firstpage :
235
Lastpage :
236
Keywords :
Epitaxial growth; Epitaxial layers; Hysteresis; III-V semiconductor materials; Indium phosphide; Lithography; Nanowires; Optical films; Substrates; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference Digest, 2005. DRC '05. 63rd
Print_ISBN :
0-7803-9040-7
Type :
conf
DOI :
10.1109/DRC.2005.1553136
Filename :
1553136
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=445380
