DocumentCode
445669
Title
Defining of requirements to substrate drive for magnetron thin film deposition plants
Author
Nechaev, Mikhail A.
Author_Institution
Tomsk Polytech. Univ., Russia
Volume
1
fYear
2004
fDate
26 June-3 July 2004
Firstpage
270
Abstract
An adequate design of all parts of sputtering plants is necessary for coating uniformity. This paper discussed the correlation between the substrate speed and coating uniformity for requirements estimation of electric drive dynamic behavior. It is shown here that the drive should be having response time about five times less sputtering time.
Keywords
electric drives; industrial plants; sputter deposition; thin films; coating uniformity; electric drive dynamic behavior; magnetron thin film; sputtering plants; substrate drive; thin film deposition plants; Coatings; Delay; Design engineering; Displays; Equations; Glass; Nuclear electronics; Sputtering; Substrates; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Science and Technology, 2004. KORUS 2004. Proceedings. The 8th Russian-Korean International Symposium on
Print_ISBN
0-7803-8383-4
Type
conf
DOI
10.1109/KORUS.2004.1555342
Filename
1555342
Link To Document