DocumentCode :
446563
Title :
Laser patterning - innovative technology for mass production of microstructures
Author :
Ulieru, Dumitru ; Ciuciumis, Alina
Volume :
1
fYear :
2005
fDate :
3-5 Oct. 2005
Firstpage :
245
Abstract :
The improvement of pattern resolution for microsystems fabrication is certainly a proven method for increasing of micro and nanostructure density. Our novel laser technology could be applied for thin metal or alloy films on polymer substrates, which could be structured directly with the laser direct patterning process. So is possible to manufacture ultrafine conductive or reflective structures down to 15 μm in an economical and environmentally friendly way. Increasing demand on the accuracy of microsystems and sensors requires microstructures with lines and spaces down of approximately 5-100 μm.
Keywords :
laser ablation; mass production; microsensors; nanopatterning; nanostructured materials; thin films; laser patterning; laser technology; mass production; microsystems fabrication; polymer substrates; reflective structure; sensors; thin film; ultrafine conductive structure; Chemical lasers; Laser ablation; Laser beam cutting; Laser modes; Mass production; Microstructure; Polymer films; Sensor systems; Space technology; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 2005. CAS 2005 Proceedings. 2005 International
Print_ISBN :
0-7803-9214-0
Type :
conf
DOI :
10.1109/SMICND.2005.1558759
Filename :
1558759
Link To Document :
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