• DocumentCode
    448225
  • Title

    Fabrication of optical waveguides in phosphorus-doped flame hydrolysis silica by direct electron-beam exposure

  • Author

    García-Blanco, S. ; Aitchison, J.S. ; Taylor, R.S. ; Hnatovsky, C.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
  • Volume
    2
  • fYear
    2005
  • fDate
    22-27 May 2005
  • Firstpage
    1279
  • Abstract
    The refractive index profiles of optical waveguides fabricated by electron-beam irradiation of phosphorus doped flame-hydrolysis deposited silica were studied by microreflectivity. The results were compared with those obtained for germanium-doped silica.
  • Keywords
    electron beam effects; germanium; integrated optics; laser materials processing; optical fabrication; optical waveguides; reflectivity; silicon compounds; GeO2-SiO2; direct electron-beam exposure; fabrication; optical waveguides; phosphorus-doped flame hydrolysis; silica; Biomedical optical imaging; Fires; Optical device fabrication; Optical films; Optical refraction; Optical variables control; Optical waveguides; Refractive index; Silicon compounds; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2005. (CLEO). Conference on
  • Print_ISBN
    1-55752-795-4
  • Type

    conf

  • DOI
    10.1109/CLEO.2005.202098
  • Filename
    1573164
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=448225