DocumentCode :
448225
Title :
Fabrication of optical waveguides in phosphorus-doped flame hydrolysis silica by direct electron-beam exposure
Author :
García-Blanco, S. ; Aitchison, J.S. ; Taylor, R.S. ; Hnatovsky, C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
Volume :
2
fYear :
2005
fDate :
22-27 May 2005
Firstpage :
1279
Abstract :
The refractive index profiles of optical waveguides fabricated by electron-beam irradiation of phosphorus doped flame-hydrolysis deposited silica were studied by microreflectivity. The results were compared with those obtained for germanium-doped silica.
Keywords :
electron beam effects; germanium; integrated optics; laser materials processing; optical fabrication; optical waveguides; reflectivity; silicon compounds; GeO2-SiO2; direct electron-beam exposure; fabrication; optical waveguides; phosphorus-doped flame hydrolysis; silica; Biomedical optical imaging; Fires; Optical device fabrication; Optical films; Optical refraction; Optical variables control; Optical waveguides; Refractive index; Silicon compounds; Ultrafast optics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2005. (CLEO). Conference on
Print_ISBN :
1-55752-795-4
Type :
conf
DOI :
10.1109/CLEO.2005.202098
Filename :
1573164
Link To Document :
بازگشت