DocumentCode :
4495
Title :
Surface-Potential-Based Compact Modeling of Gate Current in AlGaN/GaN HEMTs
Author :
Ghosh, Sudip ; Dasgupta, Avirup ; Khandelwal, Sourabh ; Agnihotri, Shantanu ; Chauhan, Yogesh Singh
Author_Institution :
Dept. of Electr. Eng., IIT Kanpur, Kanpur, India
Volume :
62
Issue :
2
fYear :
2015
fDate :
Feb. 2015
Firstpage :
443
Lastpage :
448
Abstract :
In this paper, the gate current in AlGaN/GaN high-electron mobility transistors is modeled analytically in a surface potential-based compact model. Thermionic emission and Poole-Frenkel emission are two dominant mechanisms for the gate current in the forward and reverse-bias regions, respectively. In addition, a trap-assisted tunneling component, which is important at low reverse bias, is also added. The developed gate current model, implemented in Verilog-A is in excellent agreement with experimental data and passes the important Gummel symmetry test.
Keywords :
III-V semiconductors; Poole-Frenkel effect; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; surface potential; thermionic emission; tunnelling; wide band gap semiconductors; AlGaN-GaN; Gummel symmetry test; HEMTs; Poole-Frenkel emission; Verilog-A; forward-bias regions; gate current model; high-electron mobility transistors; reverse-bias regions; surface-potential-based compact modeling; thermionic emission; trap-assisted tunneling component; Aluminum gallium nitride; Gallium nitride; HEMTs; Leakage currents; Logic gates; MODFETs; Mathematical model; Compact model; GaN high-electron mobility transistor (HEMT); Poole–Frenkel (PF) emission.; Poole???Frenkel (PF) emission; gate leakage current;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2360420
Filename :
6930793
Link To Document :
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