• DocumentCode
    451617
  • Title

    Photoelectron collection efficiency in CH4 and Xe-CH4 mixtures

  • Author

    Rachinhas, P.J.B.M. ; Escada, J.M.D. ; Dias, T.H.V.T. ; Santos, F.P. ; Lopes, J.A.M. ; Conde, C.A.N. ; Stauffer, A.D.

  • Author_Institution
    Departamento de Fisica, Coimbra Univ., Portugal
  • Volume
    3
  • fYear
    2005
  • fDate
    23-29 Oct. 2005
  • Firstpage
    1271
  • Lastpage
    1274
  • Abstract
    The collection efficiency f for the photoelectrons emitted from a CsI photocathode into Xe-CH4 mixtures, for incident photons Eph in the 6.8-9.8 eV (183-127 nm) energy range and applied electric fields from E/N = 0.1 Td to E/N = 40 Td is investigated by Monte Carlo simulation, following a previous study in CH4 and Ar-CH4 mixtures. The dependence of f on the reduced electric field E/N, incident photon energy Eph and mixture composition is analyzed. To test the electron scattering cross-sections used in the simulation, electron drift parameters in Xe and Xe-CH4 mixtures are calculated and compared with available experimental data.
  • Keywords
    Monte Carlo methods; drift chambers; scintillation counters; Ar-CH4 mixtures; CsI photocathode; Monte Carlo simulation; Xe-CH4 mixtures; electron drift parameters; electron scattering cross-sections; photoelectron collection efficiency; Argon; Cathodes; Electromagnetic scattering; Electron mobility; Gases; Instruments; Particle scattering; Physics; Scattering parameters; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium Conference Record, 2005 IEEE
  • ISSN
    1095-7863
  • Print_ISBN
    0-7803-9221-3
  • Type

    conf

  • DOI
    10.1109/NSSMIC.2005.1596551
  • Filename
    1596551
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=451617