Title :
Photoelectron collection efficiency in CH4 and Xe-CH4 mixtures
Author :
Rachinhas, P.J.B.M. ; Escada, J.M.D. ; Dias, T.H.V.T. ; Santos, F.P. ; Lopes, J.A.M. ; Conde, C.A.N. ; Stauffer, A.D.
Author_Institution :
Departamento de Fisica, Coimbra Univ., Portugal
Abstract :
The collection efficiency f for the photoelectrons emitted from a CsI photocathode into Xe-CH4 mixtures, for incident photons Eph in the 6.8-9.8 eV (183-127 nm) energy range and applied electric fields from E/N = 0.1 Td to E/N = 40 Td is investigated by Monte Carlo simulation, following a previous study in CH4 and Ar-CH4 mixtures. The dependence of f on the reduced electric field E/N, incident photon energy Eph and mixture composition is analyzed. To test the electron scattering cross-sections used in the simulation, electron drift parameters in Xe and Xe-CH4 mixtures are calculated and compared with available experimental data.
Keywords :
Monte Carlo methods; drift chambers; scintillation counters; Ar-CH4 mixtures; CsI photocathode; Monte Carlo simulation; Xe-CH4 mixtures; electron drift parameters; electron scattering cross-sections; photoelectron collection efficiency; Argon; Cathodes; Electromagnetic scattering; Electron mobility; Gases; Instruments; Particle scattering; Physics; Scattering parameters; Testing;
Conference_Titel :
Nuclear Science Symposium Conference Record, 2005 IEEE
Print_ISBN :
0-7803-9221-3
DOI :
10.1109/NSSMIC.2005.1596551
