DocumentCode :
451637
Title :
Formation of Schottky electrode for CdTe radiation detector
Author :
Toyama, Hiroyuki ; Yamazato, Masaaki ; Higa, Akira ; Maehama, Takehiro ; Ohno, Ryoichi ; Toguchi, Minoru
Author_Institution :
Dept. of Electr. & Electron. Eng., Ryukyus Univ., Okinawa, Japan
Volume :
3
fYear :
2005
fDate :
23-29 Oct. 2005
Firstpage :
1395
Lastpage :
1398
Abstract :
We investigated the effect of plasma treatment on the surface composition of CdTe and the electrical properties of Schottky contact using Al, Ti and In. The composition of the initial CdTe surface is Te-rich due to Br-methanol etching. We propose the plasma treatment method to remove the Te-rich layer. From X-ray photoelectron spectroscopy measurement, it is found that the plasma treatment can remove the Te-rich layer. The rectification properties of Al and Ti Schottky contacts formed on the plasma-treated surfaces are improved. Barrier heights of plasma-treated Schottky contacts are larger than nonplasma-treated contacts. Ideality factor is also improved by using plasma treatment. In gamma-ray spectrometry, a high-energy resolution of 1.8 keV FWHM at 59.5 keV is obtained from plasma-treated Al Schottky contact.
Keywords :
II-VI semiconductors; Schottky barriers; X-ray photoelectron spectra; aluminium; cadmium compounds; etching; gamma-ray spectra; indium; plasma materials processing; semiconductor counters; surface composition; titanium; wide band gap semiconductors; 1.8 keV; 59.5 keV; Al; Br-methanol etching; CdTe; CdTe radiation detector; In; Schottky electrode; Ti; X-ray photoelectron spectroscopy; gamma-ray spectrometry; plasma-treated Schottky contacts; plasma-treated surfaces; surface composition; Electrodes; Etching; Plasma applications; Plasma measurements; Plasma properties; Plasma x-ray sources; Radiation detectors; Schottky barriers; Spectroscopy; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nuclear Science Symposium Conference Record, 2005 IEEE
ISSN :
1095-7863
Print_ISBN :
0-7803-9221-3
Type :
conf
DOI :
10.1109/NSSMIC.2005.1596580
Filename :
1596580
Link To Document :
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