• DocumentCode
    451637
  • Title

    Formation of Schottky electrode for CdTe radiation detector

  • Author

    Toyama, Hiroyuki ; Yamazato, Masaaki ; Higa, Akira ; Maehama, Takehiro ; Ohno, Ryoichi ; Toguchi, Minoru

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Ryukyus Univ., Okinawa, Japan
  • Volume
    3
  • fYear
    2005
  • fDate
    23-29 Oct. 2005
  • Firstpage
    1395
  • Lastpage
    1398
  • Abstract
    We investigated the effect of plasma treatment on the surface composition of CdTe and the electrical properties of Schottky contact using Al, Ti and In. The composition of the initial CdTe surface is Te-rich due to Br-methanol etching. We propose the plasma treatment method to remove the Te-rich layer. From X-ray photoelectron spectroscopy measurement, it is found that the plasma treatment can remove the Te-rich layer. The rectification properties of Al and Ti Schottky contacts formed on the plasma-treated surfaces are improved. Barrier heights of plasma-treated Schottky contacts are larger than nonplasma-treated contacts. Ideality factor is also improved by using plasma treatment. In gamma-ray spectrometry, a high-energy resolution of 1.8 keV FWHM at 59.5 keV is obtained from plasma-treated Al Schottky contact.
  • Keywords
    II-VI semiconductors; Schottky barriers; X-ray photoelectron spectra; aluminium; cadmium compounds; etching; gamma-ray spectra; indium; plasma materials processing; semiconductor counters; surface composition; titanium; wide band gap semiconductors; 1.8 keV; 59.5 keV; Al; Br-methanol etching; CdTe; CdTe radiation detector; In; Schottky electrode; Ti; X-ray photoelectron spectroscopy; gamma-ray spectrometry; plasma-treated Schottky contacts; plasma-treated surfaces; surface composition; Electrodes; Etching; Plasma applications; Plasma measurements; Plasma properties; Plasma x-ray sources; Radiation detectors; Schottky barriers; Spectroscopy; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium Conference Record, 2005 IEEE
  • ISSN
    1095-7863
  • Print_ISBN
    0-7803-9221-3
  • Type

    conf

  • DOI
    10.1109/NSSMIC.2005.1596580
  • Filename
    1596580