Title :
Surface Defect Imaging of Semiconductor Wafers, Microelectronics, and Spacecraft Structures
Author :
Giakos, George C. ; Medithe, A. ; Sumrain, S. ; Sukumar, S. ; Fraiwan, L. ; Orozco, A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Akron Univ., OH
Abstract :
The purpose of this study is to present novel optical imaging techniques, based on all active Muller matrix optical polarimetric principles, for efficient detection, inspection and monitoring of semiconductor and microelectronic components, and spacecraft structure. The experimental results of this study indicate that the polarimetric imaging techniques are highly efficient in detecting defects on semiconductor structures when compared to nonpolarimetric techniques
Keywords :
aerospace materials; flaw detection; inspection; monitoring; optical images; polarimetry; semiconductor materials; space vehicles; Muller matrix optical polarimetric principles; Muller polarimetric imaging; linear polarization degree; microelectronic components; optical imaging techniques; polarimetric imaging techniques; semiconductor wafers; spacecraft structures; surface defect imaging; Inspection; Microelectronics; Optical devices; Optical imaging; Optical modulation; Optical polarization; Optical sensors; Optical surface waves; Space technology; Space vehicles; Mueller polarimetric imaging; degree of linear polarization (DOLP); spacecraft structure inspection; wafer semiconductor inspection and microelectronics;
Conference_Titel :
Instrumentation and Measurement Technology Conference, 2005. IMTC 2005. Proceedings of the IEEE
Conference_Location :
Ottawa, Ont.
Print_ISBN :
0-7803-8879-8
DOI :
10.1109/IMTC.2005.1604319
