• DocumentCode
    453125
  • Title

    Comparative studies on (no)patterned ground shield (PGS) RF-CMOS transformers at different temperatures

  • Author

    Jing-Lin Shi ; Wen-Yan Yin ; Junfa Mao ; Le-Wei Li

  • Author_Institution
    Inst. of Microelectron., Singapore, Singapore
  • Volume
    2
  • fYear
    2005
  • fDate
    4-7 Dec. 2005
  • Abstract
    Extensively comparative studies are carried out on the performance of on-chip CMOS transformers in the presence and absence of patterned ground shields (PGS) at temperatures of 253 K, 298 K, 333 K, and 373 K. These transformers were fabricated using 0.18 micron CMOS processes and designed to be interleaved and center-tapped interleaved geometries, respectively, but with the same inner dimension, metal track width, track spacing and substrate properties. Based on the two-port S-parameters measured at different temperatures, all performance indicators, such as maximum available gain Gmax, Q-factor of the primary or secondary coil, power loss, and minimum noise figure of these transformers are extracted and compared with each other.
  • Keywords
    CMOS integrated circuits; S-parameters; high-frequency transformers; radiofrequency integrated circuits; two-port networks; 0.18 micron; 253 K; 298 K; 333 K; 373 K; RF-CMOS transformers; interleaved geometry; minimum noise figure; patterned ground shield; two-port S-parameters; CMOS process; Gain measurement; Geometry; Land surface temperature; Loss measurement; Power measurement; Process design; Scattering parameters; Temperature measurement; Transformers; Collector current density; Collector layer thickness; InGaAs/InP; SHBT;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference Proceedings, 2005. APMC 2005. Asia-Pacific Conference Proceedings
  • Print_ISBN
    0-7803-9433-X
  • Type

    conf

  • DOI
    10.1109/APMC.2005.1606460
  • Filename
    1606460