DocumentCode :
453125
Title :
Comparative studies on (no)patterned ground shield (PGS) RF-CMOS transformers at different temperatures
Author :
Jing-Lin Shi ; Wen-Yan Yin ; Junfa Mao ; Le-Wei Li
Author_Institution :
Inst. of Microelectron., Singapore, Singapore
Volume :
2
fYear :
2005
fDate :
4-7 Dec. 2005
Abstract :
Extensively comparative studies are carried out on the performance of on-chip CMOS transformers in the presence and absence of patterned ground shields (PGS) at temperatures of 253 K, 298 K, 333 K, and 373 K. These transformers were fabricated using 0.18 micron CMOS processes and designed to be interleaved and center-tapped interleaved geometries, respectively, but with the same inner dimension, metal track width, track spacing and substrate properties. Based on the two-port S-parameters measured at different temperatures, all performance indicators, such as maximum available gain Gmax, Q-factor of the primary or secondary coil, power loss, and minimum noise figure of these transformers are extracted and compared with each other.
Keywords :
CMOS integrated circuits; S-parameters; high-frequency transformers; radiofrequency integrated circuits; two-port networks; 0.18 micron; 253 K; 298 K; 333 K; 373 K; RF-CMOS transformers; interleaved geometry; minimum noise figure; patterned ground shield; two-port S-parameters; CMOS process; Gain measurement; Geometry; Land surface temperature; Loss measurement; Power measurement; Process design; Scattering parameters; Temperature measurement; Transformers; Collector current density; Collector layer thickness; InGaAs/InP; SHBT;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference Proceedings, 2005. APMC 2005. Asia-Pacific Conference Proceedings
Print_ISBN :
0-7803-9433-X
Type :
conf
DOI :
10.1109/APMC.2005.1606460
Filename :
1606460
Link To Document :
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