DocumentCode
453125
Title
Comparative studies on (no)patterned ground shield (PGS) RF-CMOS transformers at different temperatures
Author
Jing-Lin Shi ; Wen-Yan Yin ; Junfa Mao ; Le-Wei Li
Author_Institution
Inst. of Microelectron., Singapore, Singapore
Volume
2
fYear
2005
fDate
4-7 Dec. 2005
Abstract
Extensively comparative studies are carried out on the performance of on-chip CMOS transformers in the presence and absence of patterned ground shields (PGS) at temperatures of 253 K, 298 K, 333 K, and 373 K. These transformers were fabricated using 0.18 micron CMOS processes and designed to be interleaved and center-tapped interleaved geometries, respectively, but with the same inner dimension, metal track width, track spacing and substrate properties. Based on the two-port S-parameters measured at different temperatures, all performance indicators, such as maximum available gain Gmax, Q-factor of the primary or secondary coil, power loss, and minimum noise figure of these transformers are extracted and compared with each other.
Keywords
CMOS integrated circuits; S-parameters; high-frequency transformers; radiofrequency integrated circuits; two-port networks; 0.18 micron; 253 K; 298 K; 333 K; 373 K; RF-CMOS transformers; interleaved geometry; minimum noise figure; patterned ground shield; two-port S-parameters; CMOS process; Gain measurement; Geometry; Land surface temperature; Loss measurement; Power measurement; Process design; Scattering parameters; Temperature measurement; Transformers; Collector current density; Collector layer thickness; InGaAs/InP; SHBT;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference Proceedings, 2005. APMC 2005. Asia-Pacific Conference Proceedings
Print_ISBN
0-7803-9433-X
Type
conf
DOI
10.1109/APMC.2005.1606460
Filename
1606460
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