• DocumentCode
    453165
  • Title

    Skin and proximity effects of curved microstrip interconnects

  • Author

    Hua, Qi ; Mao, Junfa ; Yin, Wen-Yan

  • Author_Institution
    Sch. of Electron. Inf. & Electr. Eng., Shanghai Jiao Tong Univ., China
  • Volume
    2
  • fYear
    2005
  • fDate
    4-7 Dec. 2005
  • Abstract
    An accurate procedure was proposed to capture the skin and proximity effect of microstrip interconnects on curved surfaces using an extended volume filament model. These conformal geometries can incorporate some special applications where cylindrical or even elliptic substrate must be used. Parasitic studies were performed to show the hybrid effects of all geometrical and physical parameters on the frequency-dependent distributed series resistance and inductance of these interconnects, which can be further used to predict their responses in the presence of high-power or ultra-wideband electromagnetic pulses.
  • Keywords
    interconnections; microstrip lines; skin effect; waveguide theory; conformal geometries; curved surface interconnects; distributed series inductance; distributed series resistance; extended volume filament model; microstrip interconnects; proximity effect; skin effect; ultra wideband electromagnetic pulses; EMP radiation effects; Electromagnetic induction; Frequency; Geometry; Inductance; Microstrip; Proximity effect; Skin; Surface resistance; Ultra wideband technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference Proceedings, 2005. APMC 2005. Asia-Pacific Conference Proceedings
  • Print_ISBN
    0-7803-9433-X
  • Type

    conf

  • DOI
    10.1109/APMC.2005.1606518
  • Filename
    1606518