DocumentCode
45407
Title
Scalable Virtual-Ground Multilevel-Cell Floating-Gate Flash Memory
Author
Yamauchi, Yuji ; Kamakura, Yoshinari ; Matsuoka, T.
Author_Institution
Grad. Sch. of Eng., Osaka Univ., Suita, Japan
Volume
60
Issue
8
fYear
2013
fDate
Aug. 2013
Firstpage
2518
Lastpage
2524
Abstract
An adequate gate coupling ratio (GCR) and compensation for floating-gate to floating-gate (FG-to-FG) coupling interference must be maintained to enable further scaling of virtual-ground multilevel-cell (MLC) FG flash memory. A high GCR of 0.6 is obtained using a novel bowl-shaped FG structure cell technology without sacrificing cell size. Increasing the GCR is important for reducing FG-to-FG coupling interference and achieving low-voltage operation. A novel array segmented virtual-ground architecture with bit-line isolation between neighboring segments and two-step programming with the channel hot electron injection threshold voltage compensation technique are proposed to reduce the number of neighboring cells that are programmed after programming a given cell, as well as the amount of threshold voltage (Vth) shift of the neighboring cells. Adoption of this programming approach realizes a reduction in the Vth shift caused by the FG-to-FG coupling interference in the bit-line direction, compared with conventional programming approaches, and the Vth shift is almost completely eliminated in the word-line direction without sacrificing program throughput. The proposed virtual-ground MLC FG cell, which is as small as 3F2/bit ( F is the minimum feature size) is successfully implemented into a test chip with good reliability.
Keywords
flash memories; interference (signal); low-power electronics; semiconductor device reliability; adequate gate coupling ratio; conventional programming; coupling interference; floating-gate to floating-gate; low-voltage operation; test chip; threshold voltage shift; virtual-ground multilevel-cell floating-gate flash memory; Ash; Computer architecture; Couplings; Interference; Microprocessors; Programming; Random access memory; Coupling interference; floating gate; gate coupling ratio; multilevel-cell; neighboring cell leakage; scaling; virtual-ground;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2270565
Filename
6560390
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