Plasmonic Terahertz Waveguide Based on Anisotropically Etched Silicon Substrate

Author

Shanshan Li ; Jadidi, Mohammad M. ; Murphy, Thomas E. ; Kumar, Girish

Author_Institution

Dept. of Electr. & Comput. Eng., Univ. of Maryland, College Park, MD, USA

Volume

4

Issue

4

fYear

2014

fDate

Jul-14

Firstpage

454

Lastpage

458

Abstract

We experimentally examine anisotropically etched silicon surfaces for terahertz (THz) plasmonic guided wave applications. Highly doped silicon surfaces are anisotropically etched to form a one-dimensional array of subwavelength concave pyramidal troughs. The plasmonic wave guides are found to support highly confined guided modes both in transverse and longitudinal directions. The resonant frequencies of the modes can be controlled by adjusting the geometrical parameters of the troughs. The existence of guided modes in plasmonic wave guides is also established through finite-element-based numerical simulations. These wave guides could provide a silicon-based alternative to metallic wave guides for use in future THz devices.

Keywords

elemental semiconductors; etching; finite element analysis; plasmonics; silicon; waveguides; Si; anisotropically etched silicon substrate; finite element based numerical simulations; geometrical parameters; metallic waveguides; plasmonic terahertz waveguide; subwavelength concave pyramidal troughs; Optical surface waves; Optical waveguides; Plasmons; Resonant frequency; Silicon; Surface waves; Anisotropic etching; plasmonics; subwavelength structures;

fLanguage

English

Journal_Title

Terahertz Science and Technology, IEEE Transactions on

Publisher

ieee

ISSN

2156-342X

Type

jour

DOI

10.1109/TTHZ.2014.2325739

Filename

6828788