Title :
Interaction of Light with Si Nanowire Films
Author :
Tsakalakos, Loucas ; Balch, Joleyn ; Fronheiser, Jody ; Shih, Min Yi ; LeBoeuf, Stephen F. ; Pietrzykowski, Matthew ; Codella, Peter J. ; Sulima, Oleg ; Rand, Jim ; Kumar, Anil D. ; Korevaar, Bas A.
Author_Institution :
Gen. Electr., Global Res. Center, Niskayuna, NY
Abstract :
The optical properties of silicon nanowire films fabricated on bulk Si and glass substrates are reported. The total reflectance of aligned nanowire arrays formed by a wet etch process on bulk Si is lower than the control over all wavelengths below the bandgap, varying from ~1% at 300 nm to les 10% at 1,000 nm. Similar results are observed for nanowire thin films. The observed reflectance is related to the so-called "moth-eye" effect. Modeling work shows strong resonance of light within and between nanowires
Keywords :
elemental semiconductors; etching; infrared spectra; nanotechnology; nanowires; semiconductor thin films; silicon; ultraviolet spectra; 1000 nm; 300 nm; Na2O-CaO-SiO2; Si; infrared spectra; moth-eye effect; nanowire arrays; optical properties; silicon nanowire films fabrication; silicon substrates; soda-lime glass substrates; ultraviolet spectra; wet etch process; Dielectric substrates; Glass; Nanobioscience; Nanoscale devices; Optical films; Reflectivity; Semiconductor films; Silicon; Solids; Wet etching;
Conference_Titel :
Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
1-4244-0017-1
Electronic_ISBN :
1-4244-0017-1
DOI :
10.1109/WCPEC.2006.279376
