Title :
Composition Control in the Growth of Cu(InGa)(SeS)2 by the Reaction of Cu-In-Ga PRECURSORS in H2Se and H2S
Author :
Hanket, Gregory M. ; Shafarman, William N. ; Birkmi, Robert W.
Author_Institution :
Inst. of Energy Conversion, Delaware Univ., Newark, DE
Abstract :
The two-reaction selenization/sulfization of metallic Cu-ln-Ga precursors is a commercially viable process for the manufacture of Cu(InGa)(SeS)2 films. In this work, the reaction pathways in single-reaction selenization and sulfization processes are studied, as well as composition profile development in two-reaction processes. Sputter-deposited precursor films were annealed at 450degC to characterize the starting intermetallic composition, or reacted in either H2Se or H2S at 450degC to observe changes in phase composition as the reaction progressed. The key observation was the formation of an initial Cu9(In0.64Ga0.36 )4 intermetallic that is depleted incongruently to form Cu9Ga4 during selenization, and Cu16In 9 during sulfization. In studying the two-reaction selenization/sulfization process, a 2times2 matrix of reaction times was examined. Samples were selenized for either 15 or 30 minutes at 450degC, followed by sulfization at 550degC for either 15 or 30 minutes. Samples selenized for 15 minutes exhibited uniform Ga through the depth of the film, while those selenized for 30 minutes exhibited the commonly observed back-contact Ga accumulation
Keywords :
annealing; copper compounds; gallium compounds; indium compounds; reaction kinetics; semiconductor growth; semiconductor thin films; sputter deposition; ternary semiconductors; 450 C; 550 C; Cu(InGa)(SeS)2; annealing; composition control; intermetallic composition; phase composition; reaction pathways; selenization; sputter-deposited precursor films; sulfization; thin film growth; Annealing; Argon; Chemistry; Energy conversion; Intermetallic; Manufacturing processes; Scanning electron microscopy; Spectroscopy; Sputtering; X-ray scattering;
Conference_Titel :
Photovoltaic Energy Conversion, Conference Record of the 2006 IEEE 4th World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
1-4244-0017-1
Electronic_ISBN :
1-4244-0017-1
DOI :
10.1109/WCPEC.2006.279517