DocumentCode
461382
Title
Litholab: a new environment for micro-lithography modeling
Author
Chen, Ye ; Shi, Zheng ; Zhou, Ke ; Ma, LYule ; Shen, Shanhu ; Yan, Xiaolang
Author_Institution
Inst. of VLSI Design, Zhejiang Univ., Hangzhou
fYear
2006
fDate
Oct. 2006
Firstpage
1453
Lastpage
1455
Abstract
With minimum feature sizing down, more advanced configurations are used in micro-lithographic systems. It is harder than before to build an accurate lithography model. In this paper, a new micro-lithography modeling environment is introduced, which provides a set of handy tools to easily customize and build models for micro-lithographic system with advanced configurations. The ability and structure of the environment are described in detail. Examples show the efficiency and accuracy of the environment
Keywords
photolithography; programming environments; semiconductor process modelling; Litholab; microlithography modeling environment; Apertures; Data visualization; Libraries; Lighting; Lithography; Polarization; Power system modeling; Production; Shape; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306234
Filename
4098438
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