Title :
Photoelectron Collection Efficiency in Mixtures of Noble Gases with CF4
Author :
Escada, J. ; Rachinhas, P.J.B.M. ; Dias, T.H.V.T. ; Santos, F.P. ; Lopes, J.A.M. ; Conde, C.A.N. ; Stauffer, A.D.
Author_Institution :
Departamento de Fisica, Univ. de Coimbra
fDate :
Oct. 29 2006-Nov. 1 2006
Abstract :
The collection efficiency f for the photoelectrons emitted from a CsI photocathode into CF4 and into Ar-CF4 and Ne-CF4 mixtures is investigated by Monte Carlo simulation The dependence of f on the reduced electric field E/N in the 0.1-40 Td range, on incident photon energy Eph in the 6.8-9.8 eV (183-127 nm) range and on mixture composition is analyzed. Electron drift parameters in CF4, Ar-CF4 and Ne-CF4 are also presented.
Keywords :
Monte Carlo methods; argon; electron beam effects; gas mixtures; neon; organic compounds; photoemission; 183 to 127 nm; 6.8 to 9.8 eV; Ar; CsI photocathode; Monte Carlo simulation; Ne; argon-tetrafluoromethane gas mixture; electron drift parameters; incident photon energy; mixture composition; neon-tetrafluoromethane gas mixture; noble-tetrafluoromethane gas mixtures; photoelectron collection efficiency; reduced electric field; Argon; Cathodes; Electron mobility; Gases; Ionization; Lamps; Mercury (metals); Nuclear and plasma sciences; Photonics; Scattering;
Conference_Titel :
Nuclear Science Symposium Conference Record, 2006. IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
1-4244-0560-2
Electronic_ISBN :
1095-7863
DOI :
10.1109/NSSMIC.2006.356023
